Biography:
Hyunyeol Rho is a Ph.D. candidate in the Department of Advanced Materials Science and Engineering at Sungkyunkwan University, South Korea. His research focuses on hafnia-based ferroelectric thin films, plasma-assisted low-temperature processing, and flexible electronic devices. He has published a paper on plasma-engineered ferroelectrics and their integration into advanced transistor architectures. His current work aims to enable low-power, flexible and 3D integration with ferroelectric devices for next-generation electronics.
Title : Low-temperature plasma-engineered hafnia ferroelectrics for high-performance flexible thin-film transistors